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PLASMOS SD-2000-LC 8"/200 mm Film Thickness Automatic Ellipsometer (Metrology)

$ 5279.99

Availability: 100 in stock
  • Model: SD-2000-LC
  • All returns accepted: ReturnsNotAccepted
  • Condition: The unit is sold as-is, untested due to a lack of expertise to test it.
  • Brand: Plasmos
  • Equipment Type: Ellipsometer
  • MPN: SD-2000-LC

    Description

    PLASMOS SD-2000-LC Automatic Ellipsometer Thin Film Thickness Measurement System (Metrology)
    Comes with a manual, software, and what you see in the pictures. If you don't see it, you probably wont get it.
    Specifications are from the manual and may vary slightly due to upgrades, options, or revisions this unit may or may not have. Information denoted with (*) and/or (**) are options that I am not sure the unit has.
    The unit is sold as-is, untested due to a lack of expertise to test it.
    The Serial Tag Reads:
    Serial Number:
    50420192
    Model Number:
    SD 2000 LC
    Voltage:
    230
    Hertz:
    50/60
    Radiation Registration Number:
    DM4 063
    Chuck Size:
    8"
    Unit has the following:
    General Signal Hevi-Duty Power System:
    Type:
    HS
    Catalog Number:
    HS1FL1A
    Primary Volts:
    240/480
    Secondary Volts:
    120/240
    Hertz, Phase, kVa:
    60, 1, 1
    Insul Class:
    180
    Lang Gmbh & Co Kg:
    Type:
    MCC 12 + 1 MP 4000
    Serial Number:
    930927029
    Voltaage:
    220 50 Hz
    TMC Picture Monitor:
    Model Number:
    TMC-9M
    AC:
    100V, 50/60Hz, 26W
    Serial Number:
    5050
    Plasmos EST3/2 Pump Controller
    General Description:
    The PLASMOS SD series Thin Film Thicknesss Measurement System work according to the ellipsometer principle, using the rotating analyzer method. The SD series is characterized by the following user features:
    light source unit provided a 632.8 nm He-Ne laser and/or one or two laser diodes of 790 nm or 1.3/1.55 µm for thicknesss measurements absorbing layers.
    simple menu-driven operation of the system software by means of function keys supported by the user friendly window technique. The system (production mode) is therefore suitable for use in routine measurements, but also for research (engineering mode).
    integrated, clean-room compatible construction as a compact system, stainless-steel frame with stainless-steel perforated sheet metal, covers, and panels of anodized aluminium or stainless steel.
    optional laminar flowbox with integrated lighting and compatible in construction and design. (*)
    the microscope-type sample stage works according to an automatically controlled X-Y grid principle with infinitely variable step size. Measurements in integrated circuit (microspot) are possible (*).
    exhaustive and informative display of the measurement results in tables, graphs, color graphs, and 3-D displays. Refraction index and layer thickness can be determined for any given measurement. Both parameters can be portrayed as both graphics and list diplays. (*)(**)
    extremely short measurement times for routine measurements (1 sec/point with SD 2300/4000/2000)
    to avoid particle generation above the wafer surfaces a CCD camera and monochrome monitor is available as an option. (*)(**)
    sample stage with an integrated vacuum plate, suitable for wafers up to 200 mm diameter, with a built-in quick action switch-off system for the vacuum. (*)
    optional vacuum tweezers for manual wafer handling. (*)
    optional automatic wafer handling system cassette in cassette for wafers up to 200 mm diameter. (*)(**)
    optional communication with a host computer via SECS/I/II protocol (*)(**)
    optional pattern recognition system, including all software. (*)(**)
    automatic foccusing unit (optional for SD 2000)
    full concolse housing made of antistatic material, compatible to any production environement (optional for SD 2000)
    The Principle of measurement:
    With the PLASMOS SD series layer thicknesss measurement system film thickness and refraction index of optically transparent and absorbing layers can be determined.
    The measurements can be made at incidence angles between 35° and 73°/90°. The SD 2000 is a rotating analyzer system.
    Unpolarized light from a He Ne laser or a laser diode (*) is directed through a polarizer to produce linearly polarized light and then, through a quarter-wave plate (compensator) to get circularly polarized light. The laser beam finally hits the sample surface at an exactly defined angle of incidence.
    With the SD 2000, the polarizer is kept at an fixed azimuth angle of 45°. The analysis of the status of polarization is done by a permanently rotating polarizer followed by a photo-detector again, whose sinoidal output signal is transferred again to the system computer for the calculation of the layer thickness and refraction index.
    Possible Applications:
    The ellipsometer measurement principle is an optical measurement technique for determining the film thickness and refractive index of optically transparent and absorbing layers, in the range between a few A and a few µm.
    The measurement technique is utilized in semiconductor technology, optics, tribology, compact disk technology and physical surface examinations.
    With the ellipsometer, the following types of thin films can be measured: dielectric and semiconducting layers, such as silicon dioxide, silicon nitride, polysilicon and amorphous silicon, interference layers, various metallic layers, and organic layers such as carbon and photoreists.
    Optically transparent sample films can be measured, as well as multiple layer systems (refraction index and thickness of films).
    For absorbing layers (e.g., semiconductors and metals), the complex refractive index and thickness can be determined when knowing one or the other.
    In addition to the above mentioned applications, liquids can be measured, as well as thin foils (self-supporting).
    The optical constants of substrate materials can also be determined (substrate program).
    Description:
    Automatic thin film measurement system for substrates of up to 150 mm dia. Capable of determining the thickness, refractive indices and absorption constants of thin films from 0 nm up to few microns.
    Key Features:
    Spot Size: 0.8 mm to 10 µm
    Software: Windows NT
    Class 1 clean room compatible
    0.00 minimum for packaging, handling, and order processing. Shipping to be determined by destination.
    Prior to shipment I will need to know the following information (filled out on a form that I will send you) for International Customers or Packages/Freight being Forwarded internationally. International customers may also be subject to a freight forwarder form if applicable.:
    (1) Are you the end-user of this item?
    (2) If you are not the ultimate end-user of the item, please state the ultimate end user's name.
    (3) What is the ultimate country destination?
    11/19/04